(WO/2008/021194) ADSORBENT COMPOSITION FOR DESULFURING A FLUID, METHOD AND APPARATUS FOR ITS USE
- Biblio. Data
- Description
- Claims
- National Phase
- Notices
- Documents
| Latest bibliographic data on file with the International Bureau
| ||||||||||||
| ||||||||||||
| IPC: | B01D 53/02 (2006.01), B01D 53/04 (2006.01), B01D 53/08 (2006.01), B01J 20/22 (2006.01), C10G 25/00 (2006.01), C10L 3/10 (2006.01) | |||||||||||
| Applicants: | THE UNIVERSITY OF HOUSTON SYSTEM [US/US]; Office of IP Management, 316 E. Cullen Bldg., Houston, TX 77204-2015 (US) (All Except US). JACOBSON, Allan, J. [US/US]; (US) (US Only). LIU, Lumei [US/US]; (US) (US Only). WANG, Xiqu [CN/US]; (US) (US Only). | |||||||||||
| Inventors: | JACOBSON, Allan, J.; (US). LIU, Lumei; (US). WANG, Xiqu; (US). | |||||||||||
| Agent: | STROZIER, Robert, W.; P.O. Box 429, Bellaire, TX 77402-0429 (US). | |||||||||||
| Priority Data: |
| |||||||||||
| Title: | ADSORBENT COMPOSITION FOR DESULFURING A FLUID, METHOD AND APPARATUS FOR ITS USE | |||||||||||
| Abstract: | An adsorbent compostion for desulfurizing a fluid comprising: at least one compound of a class of porous metal organic compounds of the general formula MOADA, where M is a tetravalent metal or a mixture of tetravalent metals, 0 is an oxygen atom, and ADA is a dianion of a dicarboxylic acid (H2ADA), where the compounds selectively and reversibly adsorb sulfur-containing components in the fluid. Method and apparatus for the use of this adsorbent composition. | |||||||||||
| Designated States: |
AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. African Regional Intellectual Property Org. (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW) Eurasian Patent Organization (EAPO) (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM) European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR) African Intellectual Property Organization (OAPI) (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG). | |||||||||||
| Publication Language: | English (EN) |
| Filing Language: | English (EN) |

