(WO/2006/094016) METHOD FOR LOW DISTORTION EMBEDDING OF EDIT DISTANCE TO HAMMING DISTANCE
- Biblio. Data
- Description
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| Latest bibliographic data on file with the International Bureau
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| IPC: | H03M 13/00 (2006.01), H03M 13/03 (2006.01) | |||||||||||
| Applicants: | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA [US/US]; 1111 Franklin Street, 5th Floor, Oakland, California 94607 (US) (All Except US). RABANI, Yuval [IL/IL]; (IL) (US Only). OSTROVSKY, Rafial [US/US]; (US) (US Only). | |||||||||||
| Inventors: | RABANI, Yuval; (IL). OSTROVSKY, Rafial; (US). | |||||||||||
| Agent: | DAVIDSON, Michael S.; 2040 Main Street, 9th Floor, Irvine, California 92614 (US). | |||||||||||
| Priority Data: |
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| Title: | METHOD FOR LOW DISTORTION EMBEDDING OF EDIT DISTANCE TO HAMMING DISTANCE | |||||||||||
| Abstract: | A method of embedding the edit distance metric into the Hamming distance metric with low distortion. In other words, two input character strings are mapped (160, 170) to two corresponding output bit strings (180) such that the Hamming distance between the output strings is approximately proportional to the edit distance between the two corresponding input strings. | |||||||||||
| Designated States: |
AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW. African Regional Intellectual Property Org. (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW) Eurasian Patent Organization (EAPO) (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM) European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR) African Intellectual Property Organization (OAPI) (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG). | |||||||||||
| Publication Language: | English (EN) |
| Filing Language: | English (EN) |
