(WO/2009/045915) CARBON NANOTUBE ASSEMBLY
- Biblio. Data
- Description
- Claims
- National Phase
- Notices
- Documents
| Latest bibliographic data on file with the International Bureau
| ||||||||||||
| ||||||||||||
| IPC: | B82B 1/00 (2006.01), C01B 31/02 (2006.01) | |||||||||||
| Applicants: | BRIGHAM YOUNG UNIVERSITY [US/US]; Technology Transfer Office, 3760 HBLL, Provo, UT 84602 (US) (All Except US). DAVIS, Robert, C. [US/US]; (US) (US Only). VANFLEET, Richard, R. [US/US]; (US) (US Only). HUTCHISON, David, N. [NZ/US]; (US) (US Only). | |||||||||||
| Inventors: | DAVIS, Robert, C.; (US). VANFLEET, Richard, R.; (US). HUTCHISON, David, N.; (US). | |||||||||||
| Agent: | HOBSON, Garron, M. et al.; Thorpe North & Western LLP, P.O. Box 1219, Sandy, UT 84091-1219 (US). | |||||||||||
| Priority Data: |
| |||||||||||
| Title: | CARBON NANOTUBE ASSEMBLY | |||||||||||
| Abstract: | A carbon nanotube assembly comprises a plurality of carbon nanotubes arranged into a patterned frame (10) and extending from a base (33) of the patterned frame to a face (31) of the patterned frame, the patterned frame having a height of at least about 10 μm or greater. At least one passage (14) extends through or is defined in the patterned frame, the at least one passage extending from the base of the patterned frame to the face of the patterned frame. An interstitial material at least partially fills interstices between at least some of the carbon nanotubes. | |||||||||||
| Designated States: |
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. African Regional Intellectual Property Org. (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW) Eurasian Patent Organization (EAPO) (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM) European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR) African Intellectual Property Organization (OAPI) (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG). | |||||||||||
| Publication Language: | English (EN) |
| Filing Language: | English (EN) |
