(WO/2008/008169) USING ELECTRICAL PROBES FOR DETECTING IMPURITIES IN REACTOR SYSTEMS

(WO/2008/008169) USING ELECTRICAL PROBES FOR DETECTING IMPURITIES IN REACTOR SYSTEMS

Latest bibliographic data on file with the International Bureau
Pub. No.:  WO/2008/008169   International Application No.:  PCT/US2007/014708
Publication Date:17.01.2008 International Filing Date:25.06.2007
Chapter 2 Demand Filed: 06.05.2008
IPC: B01J 8/24 (2006.01)
Applicants:UNIVATION TECHNOLOGIES, LLC [US/US]; 5555 San Felipe, Suite 1950, Houston, TX 77056-2746 (US) (All Except US).
MARKEL, Eric, J. [US/US]; (US) (US Only).
HAGERTY, Robert, O. [US/US]; (US) (US Only).
MUHLE, Michael, E. [US/US]; (US) (US Only).
Inventors:MARKEL, Eric, J.; (US).
HAGERTY, Robert, O.; (US).
MUHLE, Michael, E.; (US).
Agent:ARECHEDERRA, Leandro, III et al.; Univation Technologies, LLC, 5555 San Felipe, Suite 1950, Houston, TX 77056-2746 (US).
Priority Data:
60/819,326 07.07.2006 US
Title: USING ELECTRICAL PROBES FOR DETECTING IMPURITIES IN REACTOR SYSTEMS
Abstract: The present invention is directed to various methods and systems for detecting at least one impurity in a bulk fluid (10), using at least one electrical probe (40). The methods are performed in conjunction with a polymerization reactor system (100) such as a gas-phase reactor system.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Org. (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (EAPO) (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (OAPI) (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language:English (EN)
Filing Language:English (EN)

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