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Search result: 23 of 37 |
(WO/2006/110279) SELECTIVE WET ETCHING OF METAL NITRIDES
- Biblio. Data
- Description
- Claims
- National Phase
- Notices
- Documents
| Latest bibliographic data on file with the International Bureau
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| IPC: | H01L 21/3213 (2006.01) | |||||||||||||||
| Applicants: |
SACHEM, INC. [US/US]; 821 East Woodward Street, Austin, Texas 78704 (US) (All Except US). WOJTCZAK, William, A. [US/US]; (US) (US Only). DEWULF, Dean [US/US]; (US) (All Except US). | |||||||||||||||
| Inventor: | WOJTCZAK, William, A.; (US). | |||||||||||||||
| Agent: | ADAMS, Thomas, W.; Renner, Otto, Boisselle & Sklar, LLP, 1621 Euclid Avenue, 19th Floor, Cleveland, Ohio 44115 (US). | |||||||||||||||
| Priority Data: |
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| Title: |
SELECTIVE WET ETCHING OF METAL NITRIDES |
| Abstract: |
In one embodiment, the present invention relates to a wet etching composition including hydrogen peroxide; an organic onium hydroxide; and an acid. In another embodiment, the invention relates to a method of wet etching metal nitride selectively to surrounding structures comprising one or more of silicon, silicon oxides, glass, PSG, BPSG, BSG, silicon oxynitride, silicon nitride and silicon oxycarbide and combinations and mixtures thereof and/or photoresist materials, including steps of providing a wet etching composition including hydrogen peroxide, an organic onium hydroxide, and an organic acid; and exposing a metal nitride to be etched with the wet etching composition for a time and at a temperature effective to etch the metal nitride selectively to the surrounding structures. |
| Designated States: |
AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW. African Regional Intellectual Property Org. (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW) Eurasian Patent Organization (EAPO) (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM) European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR) African Intellectual Property Organization (OAPI) (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG). |
| Publication Language: | English (EN) |
| Filing Language: | English (EN) |
