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(WO/2006/098868) BIPOLAR JUNCTION TRANSISTOR WITH HIGH BETA

(WO/2006/098868) BIPOLAR JUNCTION TRANSISTOR WITH HIGH BETA

Latest bibliographic data on file with the International Bureau
Pub. No.:  WO/2006/098868   International Application No.:  PCT/US2006/006814
Publication Date:21.09.2006 International Filing Date:24.02.2006
IPC: H01L 29/76 (2006.01), H01L 27/082 (2006.01), H01L 27/095 (2006.01), H01L 29/70 (2006.01)
Applicant:LATTICE SEMICONDUCTOR CORPORATION [US/US]; 5555 Ne Moore Ct, Hillsboro, Oregon 97124 (US) (All Except US).
Inventors:BARTEL, Robert; (US).
SMOAK, Richard; (US).
AGAM, Moshe; (US).
MCDONALD, Adrian; (US).
Agent:BECKER, Mark; Lattice Semiconductor Corporation, 5555 Ne Moore Ct., Hillsboro, Oregon 97124 (US).
Priority Data:
11/078,801 11.03.2005 US
Title: BIPOLAR JUNCTION TRANSISTOR WITH HIGH BETA
Abstract: In one embodiment of the invention, a bipolar junction transistor (BJT) includes an emitter (216A) comprised of a first doped region doped with a first dopant of a first conductivity type. In addition, a salicide block (224) is disposed over a periphery portion (226) of t first doped region, and a suicide (242A) is formed on an exposed portion of the first doped region inside the periphery portion (226). Such a salicide block (224) prevents formation of salicide down to a base region (210A) in turn preventing leakage current through the base for increased of the BJT.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Org. (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (EAPO) (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (OAPI) (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language:English (EN)
Filing Language:English (EN)

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