IPC Definitions - January 01, 2012
G03F 1/76 - Definition
This group covers:
Subject matter of subgroup G03F 1/68 in which the processes for preparing patterned radiation modifying products include patterning of masks by imaging.
Note. Typically, this imaging to pattern the mask is accomplished by selectively exposing and developing a photosensitive layer (e.g., a photoresist layer on a mask blank) for defining a pattern therein that is used to form the resulting patterned mask.