IPC Definitions - January 01, 2012

G03F 1/22 - Definition fr

Definition statement

This group covers:

Subject matter of main group G03F 1/00 in which the radiation modifying products are either patterned masks for imaging by radiation of 100 nanometers or shorter wavelength (e.g., X-ray masks, extreme ultraviolet (EUV) masks), mask blanks therefor, or specialized substrates for preparing such patterned masks; and the processes of preparing are directed to preparation of such patterned masks for imaging by radiation of 100 nanometers or shorter wavelength (e.g., X-ray masks, extreme ultraviolet (EUV) masks), preparation of mask blanks therefor, or preparation of specialized substrates therefor.