IPC Definitions - January 01, 2012
G03F 1/30 - Definition
This group covers:
Subject matter of subgroup G03F 1/26 in which the phase shift mask (PSM) has alternating diverse phase clear regions separated by an absorber region that represents a pattern to be reproduced, where the absorber region is usually in the form of absorber lines separated by alternating phase shift (PS) spaces and non-phase shift (non-PS) spaces in repeating sequence across a major surface of the PSM (e.g., Levenson-Shibuya PSM, etc.); and in which the process of preparing is directed to preparation of such an alternating PSM (alt-PSM).