IPC Definitions - January 01, 2012

G03F 1/29 - Definition fr

Definition statement

This group covers:

Subject matter of subgroup G03F 1/26 in which the phase shift mask (PSM) has an absorber region with an adjacent clear narrow ridge that produces phase shifted exiting illumination (180 degrees out of phase) with respect to non-phase shifted illumination exiting a non-phase shifted clear region of a transparent substrate, where the absorber region represents a pattern to be reproduced (rim PSM or outrigger PSM); and in which the process of preparing is directed to preparation of such a rim PSM or an outrigger PSM.