IPC Definitions - January 01, 2012
G03F 1/00 - Definition
This main group covers:
Patterned radiation modifying products that are chemically defined and have been patterned to modify radiation during imaging (e.g., masks, photomasks, reticles), preparation of such patterned radiation modifying products, similar or like products that function as mask blanks or specialized substrates, per se, for preparing such patterned radiation modifying products, processes of preparing such mask blanks or specialized substrates, per se (when not provided for elsewhere), pellicles, per se or pellicles in combination with patterned radiation modifying products, processes of preparing such pellicles (when not provided for elsewhere), containers that are specially adapted therefor, or processes of preparing the same (when not provided for elsewhere).
Attention is drawn to the following places, which may be of interest for search:
Electrography; electrophotography | G03G |
Photomechanical process; apparatus; photosensitive material, e.g., photoresist, in general | G03F 7/00 |
Use of photoresist structures for special production processes, e.g.: | |
Producing decorative effects | B44C |
Manufacture or treatment of semiconductor or solid state devices or parts thereof | H01L 21/00 |
Printed circuits; details of electric apparatus; manufacture of electrical components, in general | H05K |
Holographic processes or apparatus | G03H |
Special rules of classification
In this main group, at each hierarchical level, in the absence of an indication to the contrary, classification is made in the first appropriate place.