IPC Definitions - January 01, 2012
G03F 1/20 - Definition
This group covers:
Subject matter of main group G03F 1/00 in which the radiation modifying products are either patterned masks for imaging by charged particle beam (CPB) radiation (e.g., by electron beam), mask blanks therefor, or specialized substrates for preparing such patterned masks; and the processes of preparing are directed to preparation of such patterned masks for imaging by charged particle beam (CPB) radiation, preparation of mask blanks therefor, or preparation of specialized substrates therefor.