IPC 6 English version G03F !A-G03F 9/02

G03F-G03F00902

SECTION G– PHYSICS

G 03

PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY (reproduction of pictures or patterns by scanning and converting into electrical signals H 04 N) [4]

G 03 F

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B 41 B; photosensitive materials or processes for photographic purposes G 03 C; electrography, sensitive layers or processes G 03 G)

Note

In this subclass, the following terms or expressions are used with the meanings indicated:

–

"photosensitive" means not only sensitive of electromagnetic radiation but also to corpuscular radiation;

–

"photosensitive compositions" covers photosensitive substances, e.g. quinonediazides, and, if applicable, binders or additives;

–

"photosensitive materials" covers the photosensitive compositions, e.g. photoresists, the bases carrying them and, if applicable, auxiliary layers. [5]

Preparation of originals for the photomechanical production of textured or patterned surfaces (photomechanical processes in general G 03 F 7/00) [3]

by photographic processes for production of originals simulating relief

by montage processes

from printing surfaces [5]

Originals having inorganic imaging layers, e.g. chrome masks (G 03 F 1/12 takes precedence) [5]

by exposing and washing out pigmented or coloured organic layers; by colouring macromolecular patterns [5]

by exposing silver-halide-containing photosensitive materials or diazo-type photosensitive materials [5]

Originals characterised by structural details, e.g. supports, cover layers, pellicle rings [5]

Originals having apertures, e.g. for corpuscular lithography [5]

Colour separation; Correction of tonal value (photographic copying apparatus in general G 03 B)

by retouching

by photographic means

by masking

by photoelectric means

Checking the colour or tonal value of separation negatives or positives

Screening processes; Screens therefor

by projecting methods (cameras G 03 B)

changing the screen effect

changing the diaphragm effect

using line screens

using cross-line screens

using other screens, e.g. granulated screen

by contact methods

using grey half-tone screeens

using colour half-tone screens

using screens for gravure printing

combining several screens; Elimination of moire

by multiple exposure, e.g. combined processes for line photo and screen

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B 44 C, H 01 L, e.g. H 01 L 21/00, H 05 K) [3,5]

004

Photosensitive materials (G 03 F 7/12, G 03 F 7/14 take precedence) [5]

008

Azides (G 03 F 7/075 takes precedence) [5]

012

Macromolecular azides; Macromolecular additives, e.g. binders [5]

016

Diazonium salts or compounds (G 03 F 7/075 takes precedence) [5]

021

Macromolecular diazonium compounds; Macromolecular additives, e.g. binders [5]

022

Quinonediazides (G 03 F 7/075 takes precedence) [5]

023

Macromolecular quinonediazides; Macromolecular additives, e.g. binders [5]

025

Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds (G 03 F 7/075 takes precedence) [5]

027

Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G 03 F 7/075 takes precedence) [5]

028

with photosensitivity-increasing substances, e.g. photoinitiators [5]

029

Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur [5]

031

Organic compounds not covered by group G 03 F 7/029 [5]

032

with binders [5]

033

the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers [5]

035

the binders being polyurethanes [5]

037

the binders being polyamides or polyimides [5]

038

Macromolecular compounds which are rendered insoluble or differentially wettable (G 03 F 7/075 takes precedence; macromolecular azides G 03 F 7/012; macromolecular diazonium compounds G 03 F 7/021) [5]

039

Macromolecular compounds which are photodegradable, e.g. positive electron resists (G 03 F 7/075 takes precedence; macromolecular quinonediazides G 03 F 7/023) [5]

Chromates (G 03 F 7/075 takes precedence) [5]

Silver salts (G 03 F 7/075 takes precedence) [5]

used for diffusion transfer [5]

075

Silicon-containing compounds [5]

085

Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives (G 03 F 7/075 takes precedence) [5]

characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B 41 N) [5]

095

having more than one photosensitive layer (G 03 F 7/075 takes precedence) [5]

105

having substances, e.g. indicators, for forming visible images [5]

having cover layers or intermediate layers, e.g. subbing layers [5]

115

having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing [5]

Production of screen printing forms or similar printing forms, e.g. stencils

Production of collotype printing forms

Coating processes; Apparatus therefor (applying coatings to base materials in general B 05; applying photosensitive compositions to the base for photographic purposes G 03 C 1/74)

Coating curved surfaces

Exposure; Apparatus therefor (photographic printing apparatus for making copies G 03 B 27/00) [4]

207

Means for focusing, e.g. automatically (combination of positioning and focusing G 03 F 9/02; systems for automatic generation of focusing signals in general G 02 B 7/28; means for automatic focusing of projection printing apparatus G 03 B 27/34) [4]

213

Exposing with the same light pattern different positions of the same surface at the same time (G 03 F 7/207 takes precedence) [4]

Exposing sequentially with the same light pattern different positions of the same surface (G 03 F 7/207 takes precedence) [4]

Automatic means therefor [4]

Curved surfaces

Processing photosensitive materials; Apparatus therefor (G 03 F 7/12 to G 03 F 7/24 take precedence) [3,5]

for obtaining powder images (G 03 F 3/10 takes precedence) [5]

Imagewise removal using liquid means [5]

Liquid compositions therefor, e.g. developers [5]

Imagewise removal by selective transfer, e.g. peeling away [5]

Imagewise removal not covered by groups G 03 F 7/30 to G 03 F 7/34, e.g. using gas streams, using plasma [5]

Treatment before imagewise removal, e.g. prebaking [5]

Treatment after imagewise removal, e.g. baking [5]

Stripping or agents therefor [5]

Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G 03 F 7/22 takes precedence; preparation of photographic masks G 03 F 1/00; within photographic printing apparatus for making copies G 03 B 27/00) [4]

combined with means for automatic focusing (automatic focusing in general G 02 B 7/09; systems for automatic generation of focusing signals G 02 B 7/28) [4]