(0)C23F:0/1:
IPC6
SECTION C - CHEMISTRY; METALLURGY
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES;...
C23F
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C 23 F

 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES (working of metal by electro-erosion B 23 H; desurfacing by applying flames B 23 K 7/00; working metal by laser beam B 23 K 26/00; producing decorative effects by removing surface-material, e.g. by engraving, by etching, B 44 C 1/22; electrolytic etching or polishing C 25 F); INHIBITING CORROSION OF METALLIC MATERIAL; INHIBITING INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C 23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C 21 D OR C 22 F OR CLASS C 25 (inhibition or prevention of corrosion or incrustation during processing of hydrocarbons C 10 G 7/10, C 10 G 9/16, C 10 G 75/00) [4]
 

Notes

(1)

 This subclass covers inhibiting corrosion or incrustation in general, whether of or on metallic or non-metallic surfaces, subject to Note (2) below.

(2)

 This subclass does not cover:
 

-

 protective layers or coating compositions or methods of applying them; these are classified in the appropriate places, e.g. B 05, B 44, C 09 D, C 10 M, C 23 C;
 

-

 mechanical devices or constructional features of particular articles for inhibiting incrustation; these are classified in the appropriate places, e.g. in pipes or pipe fittings F 16 L 58/00;
 

-

 articles characterised by being made of materials selected for their properties of resistance to corrosion or incrustation; these are classified in the appropriate places, e.g. turbine blades F 01 D 5/28.

(3)

 Processes using enzymes or micro-organisms in order to:
 

(i)

 liberate, separate or purify a pre-existing compound or composition, or to
 

(ii)

 treat textiles or clean solid surfaces of materials
 

are further classified in subclass C 12 S. [5]

 

 

 
 

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/ 00 Etching metallic material by chemical means (manufacture of printing surfaces B 41 C; manufacture of printed circuits H 05 K) [2]

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/ 02 • Local etching  

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/ 04 • • Chemical milling  

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/ 06 • Sharpening files  

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/ 08 • Apparatus, e.g. for photomechanical printing surfaces (photomechanical reproduction G 03 F)  

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/ 10 • Etching compositions (C 23 F 1/44 takes precedence) [4]  

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/ 12 • • Gaseous compositions [4]  

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/ 14 • • Aqueous compositions [4]  

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/ 16 • • • Acidic compositions (C 23 F 1/42 takes precedence) [4]  

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/ 18 • • • • for etching copper or alloys thereof [4]  

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/ 20 • • • • for etching aluminium or alloys thereof [4]  

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/ 22 • • • • for etching magnesium or alloys thereof [4]  

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/ 24 • • • • for etching silicon or germanium [4]  

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/ 26 • • • • for etching refractory metals [4]  

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/ 28 • • • • for etching iron group metals [4]  

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/ 30 • • • • for etching other metallic material [4]  

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/ 32 • • • Alkaline compositions (C 23 F 1/42 takes precedence) [4]  

1
/ 34 • • • • for etching copper or alloys thereof [4]  

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/ 36 • • • • for etching aluminium or alloys thereof [4]  

1
/ 38 • • • • for etching refractory metals [4]  

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/ 40 • • • • for etching other metallic material [4]  

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/ 42 • • • containing a dispersed water-immiscible liquid [4]  

1
/ 44 • Compositions for etching metallic material from a metallic material substrate of different composition [4]  

1
/ 46 • Regeneration of etching compositions [4]  
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